| 期刊論文1. | 林育輝(2004)。審查品質檢視(Quality Review)--美國專利核准通知(Notice of allowance)發出後的特殊審查程序。台一顧問通訊,113,4-6。 延伸查詢![new window](/gs32/images/newin.png) | 圖書1. | Chisum, Donald S.、Nard, Craig Allen、Schwartz, Herbert F.、Newman, Pauline、Kieff, F. Scott(2004)。Principles of Patent Law: Cases and Materials。Foundation Press。 ![](/gs32/thssjcncl/image/nclsfx.gif) ![new window](/gs32/images/newin.png) | 2. | Moy, R. Carl(2007)。Moy’s Walker on Patents。Thomson/West。 ![](/gs32/thssjcncl/image/nclsfx.gif) ![new window](/gs32/images/newin.png) | 其他1. | Ladas & Parry LLP(1999)。United States-Standard of Review by Federal Circuit of Factual Determinations by Patent and Trademark Office,http://www.ladas.com/BULLETINS/1999/0899Bulletin/US_CAFC.html。 ![](/gs32/thssjcncl/image/nclsfx.gif) ![new window](/gs32/images/newin.png) | 2. | Carpi, Anthony。Organic Chemistry--An Introduction,http://www.visionlearning.com/library/module_viewer.php?mid=60。 ![](/gs32/thssjcncl/image/nclsfx.gif) ![new window](/gs32/images/newin.png) | 3. | Patterson Belknap Webb & Tyler LLP(2001)。WRITTEN DESCRIPTION; PRIORITY,http://www.pbwt.com/resources/news letters/detail.aspx?id=5727274f-6687-44e9-a73f-4a738dll01cd。 ![](/gs32/thssjcncl/image/nclsfx.gif) ![new window](/gs32/images/newin.png) | 4. | 半導體黃光製程的說明,http://britneyspears.ac/physics/fabrication/photolithography.htm。 延伸查詢![new window](/gs32/images/newin.png) | 5. | Bagley, Margo A.,Bessenger, F. Leslie(1998)。Intent and the Powerful Defense of Inequitable Conduct in U.S. Patent Litigation,http://www.finnegan.com/publications/news-popup.cfrm?id=118&type=article。 ![](/gs32/thssjcncl/image/nclsfx.gif) ![new window](/gs32/images/newin.png) | 6. | Bagley, Margo A.,Bessenger, F. Leslie(1998)。Intent and the Powerful Defense of Inequitable Conduct in U.S. Patent Litigation,www.finnegan.com/publications/news-popup.cfm?id=118&type=article。 ![](/gs32/thssjcncl/image/nclsfx.gif) ![new window](/gs32/images/newin.png) | |