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題名:應用基因演算法於半導體製程控制之研究--以化學機械研磨為例
書刊名:工業工程學刊
作者:葉進儀 引用關係黃寶賢
作者(外文):Yeh, Jinn-yiHuang, Bau-hsien
出版日期:2003
卷期:20:6
頁次:頁625-635
主題關鍵詞:R2R控制器實數型基因演算法化學機械研磨Run-to-run controllerReal-valued genetic algorithmChemical mechanical planarization
原始連結:連回原系統網址new window
相關次數:
  • 被引用次數被引用次數:期刊(1) 博士論文(0) 專書(0) 專書論文(0)
  • 排除自我引用排除自我引用:1
  • 共同引用共同引用:0
  • 點閱點閱:31
期刊論文
1.Ingolfsson, A.、Sachs, E.(1993)。Stability and sensitivity of an EWMA controller。Journal of Quality Technology,25,271-287。  new window
2.Sachs, E.、Hu, A.、Ingolfsson A.(1995)。Run by Run Process Control: Combining SPC and Feedback Control。IEEE Transactions on Semiconductor Manufacturing,8,26-43。  new window
3.Butler, S. W.、Stefani, J. A.(1994)。Supervisory run-to-run control of a polysilicon gate etch using in situ ellipsometry。IEEE Transactions on Semiconductor Manufacturing,7(2),193-201。  new window
4.Clarke, D. W.、Gawthrop, P. J.(1975)。Self tuning controller。IEE Proceedings: D, Control Theory and Applications,122(9),929-935。  new window
5.Del Castillo, E.(1996)。A multivariate self-tuning controller for run-to-run process control under shift and trend disturbances。IIE Transactions,28(12),1011-1021。  new window
6.Del Castillo, E.、Hurwitz, A. M.(1997)。Run to run process control: Literature review and extensions。Journal of Quality Technology,29(2),184-196。  new window
7.Del Castillo, E.、葉進儀(1998)。An adaptive run-to-run optimizing controller for linear and nonlinear semiconductor processes。IEEE Transactions on Semiconductor Manufacturing,11(2),285-295。  new window
8.Hankinson, M.、Vincent, T.、Irani, K. B.、Khargonekar, P. P.(1997)。Integrated real-time and run-to-run control of etch depth in reactive ion etching。IEEE Transactions on Semiconductor Manufacturing,10(1),121-130。  new window
會議論文
1.江行全、范書愷、任志宏、王建智(2001)。多變量自適應控制應用於半導體R2R製程。沒有紀錄。  延伸查詢new window
2.Boning, D.、Moyne, W.、Smith, T.、Moyne, J.、Hurwitz, A.(1995)。Practical issues in run by run process control。沒有紀錄。201-208。  new window
3.Edgar, T. F.、Campbell, W. J.、Bode, C.(1999)。Model-based control in microelectronics manufacturing。沒有紀錄。4185-4191。  new window
4.郭瑞祥、陳正剛、Chen, Jin-Jung(2000)。Run-to-run control schemes for CMP process subject to deterministic drifts。沒有紀錄。251-258。  new window
5.Hu, Albert、He, Du、Wong, Steve、Renteln, P.、Sachs, E.(1994)。Application of run by run controller to the chemical-mechanical planarization process II。沒有紀錄。371-378。  new window
6.Hu, Albert、Sachs, E.、Ingolfsson, A.、Langer, P.(1992)。Run-by-run process control: Performance benchmarks。沒有紀錄。73-78。  new window
學位論文
1.Adewuya, A.(1996)。New Methods in Genetic Search with Real-valued Chromosomes,Cambridge, MA。  new window
圖書
1.Goldberg, D. E.(1989)。Gene Algorithm in Search, Optimization and Machine Learning。New York:Massachusetts:Addison-Wesley。  new window
2.Haupt, R. L.、Haupt, S. E(1998)。Practical genetic algorithms。New York:John Wiley & Sons Inc.。  new window
3.Man, Kim-Fung、Tang, Wallace Kit Sang、鄺得互(1999)。Genetic Algorithms: Concepts and Designs。Genetic Algorithms: Concepts and Designs。London, UK。  new window
4.Moyne, J.、Del Castillo, E.、Hurwitz, A. M.(2001)。Run-to-run control in semiconductor manufacturing。Run-to-run control in semiconductor manufacturing。Florida, USA。  new window
 
 
 
 
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